000 00698nam a2200229Ia 4500
008 230209s2021 xx 000 0 und d
022 _a978-1-6654-2079-2
022 _a978-1-6654-2080-8
041 _aeng
245 _a2021 International Workshop on Advanced Patterning Solutions (IWAPS)
260 _bIEEE
_c2021
500 _aProceeding
650 _aCircuits
650 _aComponents
650 _aComputing and Processing
650 _aDevices and Systems
650 _aDielectrics and Plasmas
650 _aEngineered Materials
650 _aEngineering Profession
650 _aPhotonics and Electrooptics
856 _uhttps://ieeexplore.ieee.org/servlet/opac?punumber=9670881
999 _c26653
_d26653