| 000 | 00698nam a2200229Ia 4500 | ||
|---|---|---|---|
| 008 | 230209s2021 xx 000 0 und d | ||
| 022 | _a978-1-6654-2079-2 | ||
| 022 | _a978-1-6654-2080-8 | ||
| 041 | _aeng | ||
| 245 | _a2021 International Workshop on Advanced Patterning Solutions (IWAPS) | ||
| 260 |
_bIEEE _c2021 |
||
| 500 | _aProceeding | ||
| 650 | _aCircuits | ||
| 650 | _aComponents | ||
| 650 | _aComputing and Processing | ||
| 650 | _aDevices and Systems | ||
| 650 | _aDielectrics and Plasmas | ||
| 650 | _aEngineered Materials | ||
| 650 | _aEngineering Profession | ||
| 650 | _aPhotonics and Electrooptics | ||
| 856 | _uhttps://ieeexplore.ieee.org/servlet/opac?punumber=9670881 | ||
| 999 |
_c26653 _d26653 |
||